Comparative effectiveness of reactive ion etching plasma and ethylene oxide sterilization technology

• In: G38 - Manufacturing and good manufacturing practice IPS (part 2) on Wednesday, 5 September 2007, 13:00-15:30
• At: Beijing (China) (2007)
• Type: Presentations + Posters
• By: SILVA, Juliano (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
• Co-author(s): Bonato, Claudio (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
  Moreira, Adit (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
  Oliveira, Débora (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
  Mansano, Ronaldo (Laboratory of Integrated Systems-EP/USP, São Paulo, Brazil)
  Pinto, Terezinha (Faculty of Pharmaceutical Sciences / USP, São Paulo, Brazil)
  
• Abstract:

  The low-temperature plasma systems have had a very broad range of applications ever since their discovery. Nowadays, plasma represents an increasingly popular alternative to ethylene oxide (EtO) to sterilize heat-sensitive medical instruments. In this work, studies were performed taking into account a plasma sterilization technology using a

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